Materials and Processes for Next Generation Lithography by Alex Robinson,Richard Lawson

By Alex Robinson,Richard Lawson

As the necessities of the semiconductor became extra challenging when it comes to solution and velocity it's been essential to push photoresist fabrics a ways past the services formerly estimated. at the moment there's major world wide examine attempt in to so referred to as subsequent iteration Lithography concepts akin to EUV lithography and multibeam electron beam lithography.

those advancements in either the economic and the educational lithography arenas have ended in the proliferation of various novel ways to withstand chemistry and inventive extensions of conventional photopolymers. at present such a lot texts during this quarter specialise in both lithography with maybe one or chapters on resists, or on conventional face up to fabrics with quite little attention of latest ways.

This ebook consequently goals to compile the worlds premier withstand improvement scientists from some of the neighborhood to provide in a single position a definitive description of the various techniques to lithography fabrication.

  • Assembles up to date details from the world’s finest withstand chemists and strategy improvement lithographers at the homes and features of the wide variety of face up to fabrics at present less than investigation
  • Includes info on processing and metrology techniques
  • Brings jointly a number of ways to litho trend recording from academia and in a single place

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Materials and Processes for Next Generation Lithography (Frontiers of Nanoscience)

Because the specifications of the semiconductor became extra challenging by way of solution and pace it's been essential to push photoresist fabrics some distance past the services formerly estimated. at present there's major around the world examine attempt in to so known as subsequent new release Lithography ideas corresponding to EUV lithography and multibeam electron beam lithography.

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